Generations of lithography machines

Shorter wavelength can print smaller features on a chip.

KrF and ArF are excimer lasers (lasers that use a noble gas mixed with fluorine). KrF uses krypton + fluorine (248 nm); ArF uses argon + fluorine (193 nm). DUV = deep ultraviolet; EUV = extreme ultraviolet.
Chart: Veronika BlablováGet the dataCreated with Datawrapper